Domestic photoresist has made great progress: 90-28nm has supported memory chips and logic chips
Release time:
2022-04-17 00:00
Source:
It is well known that in the manufacturing process of chips, there are many equipment and materials required. Among them, lithography machines and photoresists are currently products that are seriously stuck in the neck.
Taking photoresist as an example, there are five types of photoresists: g-line, i-line, KrF, ArF, and EUV. Among them, g-line and i-line are mainly used for processes above 250 nm, and the self-sufficiency rate in China is about 20%.
KrF is generally used for 250nm-130nm processes, with a self-sufficiency rate of about 5% in China. ArF is generally used for 130nm-14nm, which cannot be produced in China before 2021 and mainly relies on imports. As for EUV photoresist, it is mainly used for 7nm and below processes, not to mention completely relying on imports.
However, since last year, several major domestic photoresist manufacturers have made significant progress in the field of photoresist, and have developed ArF photoresists, such as Nanda Optoelectronics. In the second half of last year, they stated that they had been used on storage chips in the 50nm process and passed customer verification.
Recently, Nanda Optoelectronics stated that its ArF photoresist used for the 90nm to 28nm process has been verified by storage chip manufacturing and logic chip manufacturing enterprises, respectively.
The ArF photoresist developed by the company can already be used for storage chips and logic chips with a maximum process of 28 nm. After all, after verification, it can be shipped to customers.
Nanda Optoelectronics even said that one of its customers has been purchasing the company's photoresist products regularly since August last year, only because it is a customized product and has not yet formed a large-scale sales.
What do you think of this? As an essential material in chip manufacturing, photoresist is used in a small amount, but it is very important. There are no other alternatives. It has been monopolized by Japanese manufacturers before, and South Korea has been stuck in the neck.
Today, Chinese manufacturers are able to launch ArF photoresist for 28 nm, which is really a significant progress. I believe that it will not be too difficult to continue to push forward and reach 14 nm.
I also hope that the entire domestic semiconductor industry chain can be advanced to 28 nm, and then to 14 nm, just like photoresist. That way, there is not much to worry about. After all, if we handle 14 nm, we can produce at least 80% of the global chips.
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